The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
The sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 100.
When the incident energy is higher than the threshold energy, however, the sputtering yield increases with the increase of the incident energy.
Ion sputtering yields on t? Ti target are numerically calculated with TRIM program.
